@phdthesis{digilib37572,
           month = {August},
           title = {FABRIKASI DAN KARAKTERISASI LAPISAN TIPIS NiO/Ag
SEBAGAI FOTOKATALIS DEGRADASI ZAT WARNA
METHYLENE BLUE},
          school = {UIN Sunan Kalijaga},
          author = {NIM 15620010 Lizara Carina Sardy},
            year = {2019},
            note = {Asih Melati, M. Sc.,},
        keywords = {NiO/Ag thin films, photocatalytic degradation, methylene blue, Lapisan Tipis NiO/Ag, Degradasi fotokatalis, methylene blue},
             url = {https://digilib.uin-suka.ac.id/id/eprint/37572/},
        abstract = {ABSTRACT
The research was conducted about fabrication and characterization NiO/Ag thin films as a
photocatalyst degradation of methylene blue dye. This study aims to producted NiO/Ag thin films
which prepared by RF sputtering technique at a frequency 13.56 MHz on characterize their
crystallinity, morphological, composition and optical properties then used as a photocatalyst
degradation of methylene blue dye. NiO/Ag thin films were growth on glass substrates by RF
sputtering technique on frequency 13.56 MHz. NiO/Ag thin films were grown on glass substrates
with variation of oxygen pressure at (0.05; 0.1; 0.15) {$\times$} 10-2 mbar with time deposition 1 minute for
UV-Vis analysis and oxygen pressure at 0.1 {$\times$} 10-2 mbar with time deposition 15 minutes for XRD,
SEM and EDX analysis. XRD analysis showed that stronger intensity thin film NiO/Ag of (111) and
(200) planes at peak positioned 2{\ensuremath{\theta}} of 37,660 and 43,230. SEM analysis, the particle NiO/Ag thin
films was homogeneous in the surface region with a diameter crystal 50.8 nm. EDX analysis of
NiO/Ag thin films showed that the Ni = 40.45\%, Ag = 13.01\% and O = 46.53\%. Based on UV-Vis
analysis variation of oxygen pressure, band gap energy was 2,8 eV, 3,1 eV and 3,2 eV. Degradation
test of methylene blue using NiO/Ag thin films and the degradation time during 4 hours. Methylene
blue degradation showed that 88,229 \%, 89,86\% dan 91,956\% for variation oxygen pressure at
(0.05; 0.1; 0.15) {$\times$} 10-2 mbar. It was concluded that was NiO/Ag thin films able to degradated dye
methylene blue. Based on the research oxygen pressure on 0,15 {$\times$} 10-2 mbar is the highest, intensty
degradation at 91,956\%.
Keywords: NiO/Ag thin films, photocatalytic degradation, methylene blue
INTISARI
Telah dilakukan penelitian tentang fabrikasi dan karakterisasi lapisan tipis NiO/Ag sebagai
fotokatalis degradasi zat warna methylene blue. Penelitian ini dikerjakan dengan membuat lapisan
tipis NiO/Ag yang dideposisikan menggunakan metode RF-Sputtering pada frekuensi 13,56 MHz.
Kemudian mengkarakterisasinya untuk mengetahui kristalinitas, struktur morfologi, komposisi dan
sifat optik serta untuk mendegradasikan methylene blue. Lapisan tipis NiO/Ag berhasil
dideposisikan di atas substrat kaca dengan menggunakan RF sputtering. Penumbuhan lapisan tipis
di atas substrat kaca dengan menvariasikan tekanan oksigen (0,05; 0,1; 0,15) {$\times$} 10-2 mbar selama 1
menit untuk analisis UV-Vis dan tekanan oksigen 0,1 {$\times$} 10-2 mbar dengan waktu deposisi 15 menit
untuk analisis XRD, SEM dan EDX. Analisis XRD menunjukan bahwa intensitas tertinggi pada
bidang (111) dan (200) yang berada pada puncak 2{\ensuremath{\theta}} 37,660 dan 43,230. Lapisan tipis NiO/Ag
memiliki morfologi yang homogen dengan diameter kristal NiO/Ag 50,8 nm. Analisis EDX
menunjukan persentase massa elemen Ni = 40,45\%, Ag = 13,01\% dan O = 46,53\%. Analisis UVVis
dengan variasi tekanan oksigen didapat energi celah pita dari lapisan tipis NiO/Ag, yaitu 2,8 eV,
3,1 eV dan 3,2 eV. Uji fotodegradasi methylene blue menggunakan lapisan tipis NiO/Ag dengan
waktu degradasi selama 4 jam penyinaran UV. Degradasi methylene blue menunjukan hasil dengan
persentase 88,229 \%, 89,86\% dan 91,956\% untuk masing-masing tekanan oksigen (0,05; 0,1; 0,15)
{$\times$} 10-2 mbar. Penelitian ini menyimpulkan bahwa lapisan tipis NiO/Ag dapat mendegradasi zat warna
methylene blue dan lapisan tipis dengan tekanan oksigen 0,15{$\times$} 10-2 mbar memiliki persentase
degradasi paling tinggi sebesar 91,956\%.
Kata Kunci: Lapisan Tipis NiO/Ag, Degradasi fotokatalis, methylene blue}
}